Ultrasonically enabled low temperature electroless plating for advanced electronic manufacture

A. J. Cobley, J. E. Graves, A. Kassim, B. Mkhlef, B. Abbas

Research output: Chapter in Book/Report/Conference proceedingConference proceeding

1 Citation (Scopus)

Abstract

Electroless plating is an important process for the metallization of non-conductive substrates and is therefore widely utilized throughout the electronics and packaging industry. Electronic manufacture now requires processes and materials that can meet the demands for miniaturization and reliability since holes and via diameters in both printed circuit boards (PCBs) and microelectronics are being reduced whilst aspect ratios are getting higher. It is critical for the future development of electronics that manufacturing processes become adapted to meet these requirements. In terms of electroless plating, miniaturization means that ensuring full coverage in vias and holes is extremely challenging whilst the electroless deposit structure is important to ensure high reliability, high conductivity etc. In addition the plating process must be able to meet the need for high production volumes (i.e. high deposition rates) whilst enabling more sustainable, low energy manufacturing. Performing electroless plating in an ultrasonic field has great potential to enhance the deposit properties and meet these advanced manufacturing requirements. This paper will discuss the results from the IeMRC funded ULTIEMet (Ultrasonically enabled Low Temperature Immersion and Electroless Metallization) research project which has utilized a methodology incorporating a mixture of electrochemical and laboratory plating tests. It has been found that by optimizing how ultrasound is introduced to the electroless process benefits such as reduced temperature plating, enhanced coverage and a finer grain structure deposit can be realized.

Original languageEnglish
Title of host publication46th International Symposium on Microelectronics, IMAPS 2013
PublisherIMAPS-International Microelectronics and Packaging Society
Pages183-187
Number of pages5
ISBN (Print)9781629938240
Publication statusPublished - 2013
Event46th Annual IMAPS International Symposium on Microelectronics, IMAPS 2013 - Orlando, FL, United States
Duration: 30 Sep 20133 Oct 2013

Conference

Conference46th Annual IMAPS International Symposium on Microelectronics, IMAPS 2013
CountryUnited States
CityOrlando, FL
Period30/09/133/10/13

Keywords

  • Electroless copper
  • Plating
  • Temperature
  • Ultrasound

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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  • Cite this

    Cobley, A. J., Graves, J. E., Kassim, A., Mkhlef, B., & Abbas, B. (2013). Ultrasonically enabled low temperature electroless plating for advanced electronic manufacture. In 46th International Symposium on Microelectronics, IMAPS 2013 (pp. 183-187). IMAPS-International Microelectronics and Packaging Society.