Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks

X. Liu, S. Thomas, J. S. Aitchison, R. M. De La Rue, J. A.R. Williams, L. Everall, I. Bennion

Research output: Contribution to journalArticle

Abstract

We report the control of surface relief grating parameters and roughness for phase masks produced using e-beam lithography (EBL) and reactive ion etching (RTE). The relationships between processing conditions, grating parameters, surface roughness and the diffraction efficiency of the zeroth and the two first order transmitted beams are discussed.

Original languageEnglish
Pages (from-to)199-202
Number of pages4
JournalMicroelectronic Engineering
Volume41-42
DOIs
Publication statusPublished - Mar 1998
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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