Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks

X. Liu; S. Thomas; J. S. Aitchison; R. M. De La Rue; J. A.R. Williams; L. Everall; I. Bennion

doi:10.1016/S0167-9317(98)00045-8

Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks

X. Liu, S. Thomas, J. S. Aitchison, R. M. De La Rue, J. A.R. Williams, L. Everall, I. Bennion

Research output: Contribution to journal › Article › peer-review

Abstract

We report the control of surface relief grating parameters and roughness for phase masks produced using e-beam lithography (EBL) and reactive ion etching (RTE). The relationships between processing conditions, grating parameters, surface roughness and the diffraction efficiency of the zeroth and the two first order transmitted beams are discussed.

Original language	English
Pages (from-to)	199-202
Number of pages	4
Journal	Microelectronic Engineering
Volume	41-42
DOIs	https://doi.org/10.1016/S0167-9317(98)00045-8
Publication status	Published - Mar 1998
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/S0167-9317(98)00045-8

Cite this

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title = "Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks",

abstract = "We report the control of surface relief grating parameters and roughness for phase masks produced using e-beam lithography (EBL) and reactive ion etching (RTE). The relationships between processing conditions, grating parameters, surface roughness and the diffraction efficiency of the zeroth and the two first order transmitted beams are discussed.",

author = "X. Liu and S. Thomas and Aitchison, {J. S.} and {De La Rue}, {R. M.} and Williams, {J. A.R.} and L. Everall and I. Bennion",

year = "1998",

month = mar,

doi = "10.1016/S0167-9317(98)00045-8",

language = "English",

volume = "41-42",

pages = "199--202",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

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TY - JOUR

T1 - Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks

AU - Liu, X.

AU - Thomas, S.

AU - Aitchison, J. S.

AU - De La Rue, R. M.

AU - Williams, J. A.R.

AU - Everall, L.

AU - Bennion, I.

PY - 1998/3

Y1 - 1998/3

N2 - We report the control of surface relief grating parameters and roughness for phase masks produced using e-beam lithography (EBL) and reactive ion etching (RTE). The relationships between processing conditions, grating parameters, surface roughness and the diffraction efficiency of the zeroth and the two first order transmitted beams are discussed.

AB - We report the control of surface relief grating parameters and roughness for phase masks produced using e-beam lithography (EBL) and reactive ion etching (RTE). The relationships between processing conditions, grating parameters, surface roughness and the diffraction efficiency of the zeroth and the two first order transmitted beams are discussed.

UR - http://www.scopus.com/inward/record.url?scp=0031655071&partnerID=8YFLogxK

U2 - 10.1016/S0167-9317(98)00045-8

DO - 10.1016/S0167-9317(98)00045-8

M3 - Article

AN - SCOPUS:0031655071

SN - 0167-9317

VL - 41-42

SP - 199

EP - 202

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -

Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks

Abstract

ASJC Scopus subject areas

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