Study of interfacial defects induced during the oxidation of ultrathin strained silicon layers

V. Ioannou-Sougleridis, N. Kelaidis, C. Tsamis, D. Skarlatos, C. A. Krontiras, S. N. Georga, Ph Komninou, B. Kellerman, M. Seacrist

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2 Citations (Scopus)

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