Abstract
Selective metallization is a widely used procedure which is usually achieved by the metal deposition and photolithography processes. The present research outlines a possible alternative to traditional methodologies enabling decreased processing time and a more environmentally friendly approach. A gradient magnetic field is applied during catalyst deposition on a non-conductive substrate so that the subsequent metal plating occurs at the required pattern. A new type of magnetic catalyst was synthesized and used for substrate surface activation. The characterization of both the magnetic catalyst and the selectively metallized non-conductive material are presented in this work.
| Original language | English |
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| Pages | 69-78 |
| Number of pages | 10 |
| DOIs | |
| Publication status | Published - 1 Jan 2018 |
| Event | Symposium on Industrial Electrochemistry and Electrochemical Engineering General Session - 233rd ECS Meeting - Seattle, United States Duration: 13 May 2018 → 17 May 2018 https://www.electrochem.org/233 |
Conference
| Conference | Symposium on Industrial Electrochemistry and Electrochemical Engineering General Session - 233rd ECS Meeting |
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| Country/Territory | United States |
| City | Seattle |
| Period | 13/05/18 → 17/05/18 |
| Internet address |
ASJC Scopus subject areas
- General Engineering