Process monitoring and control using self-validating sensors

Manus Patrick Henry; David James Sandoz; David William Clarke

Process monitoring and control using self-validating sensors

Manus Patrick Henry (Inventor), David James Sandoz (Inventor), David William Clarke (Inventor)

University of Oxford

Research output: Patent

Abstract

A multi-level (hierarchical) process monitoring system comprises a process monitoring unit (14), at a higher level of the system, and a plurality of sensors (SEVA 1, SEVA 2 ... SEVA 36) at a lower level of the system, at least one of the sensors having SEVA capability (self-validating capability), the sensors being adapted to provide respective measurement values of respective process variables to said monitoring unit, said monitoring unit being so arranged as to monitor the outputs of the sensors and to identify any significant apparent change in the process conditions as detected from an overview of said sensor outputs, and on detection of an apparent significant change, to request additional status information from at least one of the SEVA sensor/s to determine whether the apparent change is in reality due to a change in the characteristics of a particular SEVA sensor rather than an actual significant change in the process conditions.

Original language	English
Patent number	GB2364783A
IPC	G08B 29/02
Priority date	23/03/00
Filing date	19/03/01
Publication status	Published - 6 Feb 2002
Externally published	Yes

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1 Patent

Process monitoring and control using self-validating sensors
Henry, M., Sandoz, D. J. & Clarke, D. W., 11 Apr 2002, IPC No. G06F 15/00 , Patent No. US2002042694A1, 23 Mar 2001, Priority date 23 Mar 2000, Priority No. GB20000007065A
Research output: Patent

Cite this

@misc{fc1ffe3c1432485b89f3de9a077d10d4,

title = "Process monitoring and control using self-validating sensors",

abstract = "A multi-level (hierarchical) process monitoring system comprises a process monitoring unit (14), at a higher level of the system, and a plurality of sensors (SEVA 1, SEVA 2 ... SEVA 36) at a lower level of the system, at least one of the sensors having SEVA capability (self-validating capability), the sensors being adapted to provide respective measurement values of respective process variables to said monitoring unit, said monitoring unit being so arranged as to monitor the outputs of the sensors and to identify any significant apparent change in the process conditions as detected from an overview of said sensor outputs, and on detection of an apparent significant change, to request additional status information from at least one of the SEVA sensor/s to determine whether the apparent change is in reality due to a change in the characteristics of a particular SEVA sensor rather than an actual significant change in the process conditions.",

author = "Henry, {Manus Patrick} and Sandoz, {David James} and Clarke, {David William}",

year = "2002",

month = feb,

day = "6",

language = "English",

type = "Patent",

note = "GB2364783A; G08B 29/02",

}

TY - PAT

T1 - Process monitoring and control using self-validating sensors

AU - Henry, Manus Patrick

AU - Sandoz, David James

AU - Clarke, David William

PY - 2002/2/6

Y1 - 2002/2/6

N2 - A multi-level (hierarchical) process monitoring system comprises a process monitoring unit (14), at a higher level of the system, and a plurality of sensors (SEVA 1, SEVA 2 ... SEVA 36) at a lower level of the system, at least one of the sensors having SEVA capability (self-validating capability), the sensors being adapted to provide respective measurement values of respective process variables to said monitoring unit, said monitoring unit being so arranged as to monitor the outputs of the sensors and to identify any significant apparent change in the process conditions as detected from an overview of said sensor outputs, and on detection of an apparent significant change, to request additional status information from at least one of the SEVA sensor/s to determine whether the apparent change is in reality due to a change in the characteristics of a particular SEVA sensor rather than an actual significant change in the process conditions.

AB - A multi-level (hierarchical) process monitoring system comprises a process monitoring unit (14), at a higher level of the system, and a plurality of sensors (SEVA 1, SEVA 2 ... SEVA 36) at a lower level of the system, at least one of the sensors having SEVA capability (self-validating capability), the sensors being adapted to provide respective measurement values of respective process variables to said monitoring unit, said monitoring unit being so arranged as to monitor the outputs of the sensors and to identify any significant apparent change in the process conditions as detected from an overview of said sensor outputs, and on detection of an apparent significant change, to request additional status information from at least one of the SEVA sensor/s to determine whether the apparent change is in reality due to a change in the characteristics of a particular SEVA sensor rather than an actual significant change in the process conditions.

M3 - Patent

M1 - GB2364783A

Y2 - 2001/03/19

ER -

Process monitoring and control using self-validating sensors

Abstract

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Research output

Process monitoring and control using self-validating sensors

Cite this