Plasma engineering of graphene

A. Dey, Alexander Chroneos, N. St. J. Braithwaite, R. P. Gandhiraman, S. Krishnamurthy

Research output: Contribution to journalArticle

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Abstract

Recently, there have been enormous efforts to tailor the properties of graphene. These improved properties extend the prospect of graphene for a broad range of applications. Plasmas find applications in various fields including materials science and have been emerging in the field of nanotechnology. This review focuses on different plasma functionalization processes of graphene and its oxide counterpart. The review aims at the advantages of plasma functionalization over the conventional doping techniques. Selectivity and controllability of the plasma techniques opens up future pathways for large scale, rapid functionalization of graphene for advanced applications. We also emphasize on atmospheric pressure plasma jet as the future prospect of plasma based functionalization processes.
Original languageEnglish
Article number021301
JournalApplied Physics Reviews
Volume3
DOIs
Publication statusPublished - 22 Apr 2016

Bibliographical note

This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing.

The following article appeared in Dey, A. , Chroneos, A. , Braithwaite, N. St. J. , Gandhiraman, R. P. and Krishnamurthy, S. (2016) Plasma engineering of graphene. Applied Physics Reviews, volume 3 : 021301 and may be found at http://dx.doi.org/10.1063/1.4947188

Keywords

  • review graphene
  • doping
  • Plasma
  • Atomospheric pressure
  • plasma
  • functionalization

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