Plasma engineering of graphene

A. Dey, Alexander Chroneos, N. St. J. Braithwaite, R. P. Gandhiraman, S. Krishnamurthy

Research output: Contribution to journalArticle

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Abstract

Recently, there have been enormous efforts to tailor the properties of graphene. These improved properties extend the prospect of graphene for a broad range of applications. Plasmas find applications in various fields including materials science and have been emerging in the field of nanotechnology. This review focuses on different plasma functionalization processes of graphene and its oxide counterpart. The review aims at the advantages of plasma functionalization over the conventional doping techniques. Selectivity and controllability of the plasma techniques opens up future pathways for large scale, rapid functionalization of graphene for advanced applications. We also emphasize on atmospheric pressure plasma jet as the future prospect of plasma based functionalization processes.
Original languageEnglish
Article number021301
JournalApplied Physics Reviews
Volume3
DOIs
Publication statusPublished - 22 Apr 2016

Fingerprint

graphene
engineering
controllability
materials science
nanotechnology
plasma jets
emerging
atmospheric pressure
selectivity
oxides

Bibliographical note

This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing.

The following article appeared in Dey, A. , Chroneos, A. , Braithwaite, N. St. J. , Gandhiraman, R. P. and Krishnamurthy, S. (2016) Plasma engineering of graphene. Applied Physics Reviews, volume 3 : 021301 and may be found at http://dx.doi.org/10.1063/1.4947188

Keywords

  • review graphene
  • doping
  • Plasma
  • Atomospheric pressure
  • plasma
  • functionalization

Cite this

Dey, A., Chroneos, A., Braithwaite, N. S. J., Gandhiraman, R. P., & Krishnamurthy, S. (2016). Plasma engineering of graphene. Applied Physics Reviews, 3, [021301]. https://doi.org/10.1063/1.4947188

Plasma engineering of graphene. / Dey, A.; Chroneos, Alexander; Braithwaite, N. St. J.; Gandhiraman, R. P.; Krishnamurthy, S.

In: Applied Physics Reviews, Vol. 3, 021301, 22.04.2016.

Research output: Contribution to journalArticle

Dey, A, Chroneos, A, Braithwaite, NSJ, Gandhiraman, RP & Krishnamurthy, S 2016, 'Plasma engineering of graphene' Applied Physics Reviews, vol. 3, 021301. https://doi.org/10.1063/1.4947188
Dey A, Chroneos A, Braithwaite NSJ, Gandhiraman RP, Krishnamurthy S. Plasma engineering of graphene. Applied Physics Reviews. 2016 Apr 22;3. 021301. https://doi.org/10.1063/1.4947188
Dey, A. ; Chroneos, Alexander ; Braithwaite, N. St. J. ; Gandhiraman, R. P. ; Krishnamurthy, S. / Plasma engineering of graphene. In: Applied Physics Reviews. 2016 ; Vol. 3.
@article{663c0c71e8d54307993a6dc2851b7fa8,
title = "Plasma engineering of graphene",
abstract = "Recently, there have been enormous efforts to tailor the properties of graphene. These improved properties extend the prospect of graphene for a broad range of applications. Plasmas find applications in various fields including materials science and have been emerging in the field of nanotechnology. This review focuses on different plasma functionalization processes of graphene and its oxide counterpart. The review aims at the advantages of plasma functionalization over the conventional doping techniques. Selectivity and controllability of the plasma techniques opens up future pathways for large scale, rapid functionalization of graphene for advanced applications. We also emphasize on atmospheric pressure plasma jet as the future prospect of plasma based functionalization processes.",
keywords = "review graphene, doping, Plasma, Atomospheric pressure, plasma, functionalization",
author = "A. Dey and Alexander Chroneos and Braithwaite, {N. St. J.} and Gandhiraman, {R. P.} and S. Krishnamurthy",
note = "This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in Dey, A. , Chroneos, A. , Braithwaite, N. St. J. , Gandhiraman, R. P. and Krishnamurthy, S. (2016) Plasma engineering of graphene. Applied Physics Reviews, volume 3 : 021301 and may be found at http://dx.doi.org/10.1063/1.4947188",
year = "2016",
month = "4",
day = "22",
doi = "10.1063/1.4947188",
language = "English",
volume = "3",
journal = "Applied Physics Reviews",
issn = "1931-9401",
publisher = "AIP Publishing",

}

TY - JOUR

T1 - Plasma engineering of graphene

AU - Dey, A.

AU - Chroneos, Alexander

AU - Braithwaite, N. St. J.

AU - Gandhiraman, R. P.

AU - Krishnamurthy, S.

N1 - This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in Dey, A. , Chroneos, A. , Braithwaite, N. St. J. , Gandhiraman, R. P. and Krishnamurthy, S. (2016) Plasma engineering of graphene. Applied Physics Reviews, volume 3 : 021301 and may be found at http://dx.doi.org/10.1063/1.4947188

PY - 2016/4/22

Y1 - 2016/4/22

N2 - Recently, there have been enormous efforts to tailor the properties of graphene. These improved properties extend the prospect of graphene for a broad range of applications. Plasmas find applications in various fields including materials science and have been emerging in the field of nanotechnology. This review focuses on different plasma functionalization processes of graphene and its oxide counterpart. The review aims at the advantages of plasma functionalization over the conventional doping techniques. Selectivity and controllability of the plasma techniques opens up future pathways for large scale, rapid functionalization of graphene for advanced applications. We also emphasize on atmospheric pressure plasma jet as the future prospect of plasma based functionalization processes.

AB - Recently, there have been enormous efforts to tailor the properties of graphene. These improved properties extend the prospect of graphene for a broad range of applications. Plasmas find applications in various fields including materials science and have been emerging in the field of nanotechnology. This review focuses on different plasma functionalization processes of graphene and its oxide counterpart. The review aims at the advantages of plasma functionalization over the conventional doping techniques. Selectivity and controllability of the plasma techniques opens up future pathways for large scale, rapid functionalization of graphene for advanced applications. We also emphasize on atmospheric pressure plasma jet as the future prospect of plasma based functionalization processes.

KW - review graphene

KW - doping

KW - Plasma

KW - Atomospheric pressure

KW - plasma

KW - functionalization

U2 - 10.1063/1.4947188

DO - 10.1063/1.4947188

M3 - Article

VL - 3

JO - Applied Physics Reviews

JF - Applied Physics Reviews

SN - 1931-9401

M1 - 021301

ER -