Phase Structure and Microstructure Of Yttria Stabilized Zirconia Thin Film Developed By Pulsed Laser Deposition

Subhasisa Nath; Indranil  Manna; Samit Kumar Ray; Jyotsna Dutta Majumdar

Phase Structure and Microstructure Of Yttria Stabilized Zirconia Thin Film Developed By Pulsed Laser Deposition

Subhasisa Nath
, Indranil Manna
, Samit Kumar Ray
, Jyotsna Dutta Majumdar

Indian Institute of Technology Kharagpur
Indian Institute of Technology Kanpur

Research output: Contribution to conference › Abstract › peer-review

Abstract

In the present study, structural characterization of yttria stabilized zirconia (YSZ) thin film developed by pulsed laser deposition under optimum condition has been undertaken. The X-ray diffraction analysis of precursor YSZ powder used for the preparation of target showed presence of mixture of monoclinic as well as tetragonal zirconia. The YSZ thin films were deposited at different substrate temperature starting from room temperature to a maximum substrate temperature of 700 °C. The YSZ thin film deposited at substrate temperature of 700 °C have been found to the optimum temperature for deposition of YSZ thin film. The developed YSZ thin film showed presence of single phase tetragonal zirconia. The microstructural analysis reveals that the structure is very dense with the thickness 1.4 ± 0.2 m.

Original language	English
Pages	64-66
Number of pages	3
Publication status	Published - 2015
Externally published	Yes
Event	Laser and Plasma Application in Material Science - Kolkata, India Duration: 15 Jan 2015 → 17 Jan 2015 Conference number: 3

Conference

Conference	Laser and Plasma Application in Material Science
Abbreviated title	LAPAMS
Country/Territory	India
City	Kolkata
Period	15/01/15 → 17/01/15

Cite this

@conference{902daf106cbe422d83313ae44fb64ccc,

title = "Phase Structure and Microstructure Of Yttria Stabilized Zirconia Thin Film Developed By Pulsed Laser Deposition",

abstract = "In the present study, structural characterization of yttria stabilized zirconia (YSZ) thin film developed by pulsed laser deposition under optimum condition has been undertaken. The X-ray diffraction analysis of precursor YSZ powder used for the preparation of target showed presence of mixture of monoclinic as well as tetragonal zirconia. The YSZ thin films were deposited at different substrate temperature starting from room temperature to a maximum substrate temperature of 700 °C. The YSZ thin film deposited at substrate temperature of 700 °C have been found to the optimum temperature for deposition of YSZ thin film. The developed YSZ thin film showed presence of single phase tetragonal zirconia. The microstructural analysis reveals that the structure is very dense with the thickness 1.4 ± 0.2 m.",

author = "Subhasisa Nath and Indranil Manna and Ray, \{Samit Kumar\} and \{Dutta Majumdar\}, Jyotsna",

year = "2015",

language = "English",

pages = "64--66",

note = "Laser and Plasma Application in Material Science, LAPAMS ; Conference date: 15-01-2015 Through 17-01-2015",

}

TY - CONF

T1 - Phase Structure and Microstructure Of Yttria Stabilized Zirconia Thin Film Developed By Pulsed Laser Deposition

AU - Nath, Subhasisa

AU - Manna, Indranil

AU - Ray, Samit Kumar

AU - Dutta Majumdar, Jyotsna

N1 - Conference code: 3

PY - 2015

Y1 - 2015

N2 - In the present study, structural characterization of yttria stabilized zirconia (YSZ) thin film developed by pulsed laser deposition under optimum condition has been undertaken. The X-ray diffraction analysis of precursor YSZ powder used for the preparation of target showed presence of mixture of monoclinic as well as tetragonal zirconia. The YSZ thin films were deposited at different substrate temperature starting from room temperature to a maximum substrate temperature of 700 °C. The YSZ thin film deposited at substrate temperature of 700 °C have been found to the optimum temperature for deposition of YSZ thin film. The developed YSZ thin film showed presence of single phase tetragonal zirconia. The microstructural analysis reveals that the structure is very dense with the thickness 1.4 ± 0.2 m.

AB - In the present study, structural characterization of yttria stabilized zirconia (YSZ) thin film developed by pulsed laser deposition under optimum condition has been undertaken. The X-ray diffraction analysis of precursor YSZ powder used for the preparation of target showed presence of mixture of monoclinic as well as tetragonal zirconia. The YSZ thin films were deposited at different substrate temperature starting from room temperature to a maximum substrate temperature of 700 °C. The YSZ thin film deposited at substrate temperature of 700 °C have been found to the optimum temperature for deposition of YSZ thin film. The developed YSZ thin film showed presence of single phase tetragonal zirconia. The microstructural analysis reveals that the structure is very dense with the thickness 1.4 ± 0.2 m.

M3 - Abstract

SP - 64

EP - 66

T2 - Laser and Plasma Application in Material Science

Y2 - 15 January 2015 through 17 January 2015

ER -

Phase Structure and Microstructure Of Yttria Stabilized Zirconia Thin Film Developed By Pulsed Laser Deposition

Abstract

Conference

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