Abstract
The characterization of voltage-dependent capacitances of power semiconductor devices [diode, MOSFET, insulated gate bipolar transistor (IGBT), etc.] is very important for modeling their dynamic performances. A measurement method using two current probes has been developed to characterize interelectrode capacitances of power devices while isolating the measurement devices from the high-voltage dc bias power source. Ciss and C oss are shown to be accurately measured while Crss is not convincing enough. Then an additional current probe is added to improve the method. Crss is shown to be well characterized by this three-current-probe method. This method has been validated using various technologies of semiconductor devices including silicon MOSFET and silicon carbide JFET. The interelectrode capacitances of power devices can be safely and accurately measured with this multiprobe method even in high voltage.
Original language | English |
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Article number | 6410437 |
Pages (from-to) | 5414-5422 |
Number of pages | 9 |
Journal | IEEE Transactions on Power Electronics |
Volume | 28 |
Issue number | 11 |
Early online date | 14 Jan 2013 |
DOIs | |
Publication status | Published - Nov 2013 |
Externally published | Yes |
Keywords
- Current probes
- high voltage
- power semiconductor devices
- silicon
- silicon carbide (SiC)
- voltage-dependent capacitances
ASJC Scopus subject areas
- Electrical and Electronic Engineering