Method For Desmearing Resin Accretions And Texturing Resin Without Using Solvent

J COBLEY ANDREW; T GOOSEY MARTIN; A POOLE MARK

Method For Desmearing Resin Accretions And Texturing Resin Without Using Solvent

J COBLEY ANDREW (Inventor), T GOOSEY MARTIN (Inventor), A POOLE MARK (Inventor)

Rohm and Haas Electronic Materials LLC

Research output: Patent

Abstract

PURPOSE: Provided is a method for desmearing resin accretions from the surface of a substrate and texturing a resin without solvent swelling and permanganate etching and without using an electrolyte such as nitric acid capable of attacking specific metal. CONSTITUTION: The method comprises the steps of generating a free radical; and contacting the surface of a substrate having resin accretions with the free radical to desmear the surface of resin accretions and to texture a resin. Preferably the free radical comprises a hydroxyl radial, a halogen radical or their mixture, and is generated chemically, by thermal decomposition or by pyrolysis. Also the method comprises the steps of generating a free radical; and contacting the surface of a substrate having resin accretions with the free radical to remove some of the resin accretions; and contacting the surface of a substrate with a promoter to remove the additional resin accretions from the surface of a substrate and to texture a resin. Preferably the promoter comprises a permanganate etching solution.

Original language	English
Patent number	KR20040038728A
IPC	H05K 3/00,H05K 3/42,C08J 7/16
Priority date	28/10/02
Filing date	28/10/03
Publication status	Published - 8 May 2004

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1 Patent

Desmear and texturing method
Cobley, A., Goosey, M. T. & Poole, M. A., 1 Nov 2004, IPC No. H05K 3/00, H05K3/42, C08J 7/16, Patent No. TW200422331A, 5 Nov 2003, Priority date 28 Oct 2002, Priority No. GB20020025012A
Research output: Patent

Cite this

@misc{3d418f051af34ba5b095a9f6f519cc3c,

title = "Method For Desmearing Resin Accretions And Texturing Resin Without Using Solvent",

abstract = "PURPOSE: Provided is a method for desmearing resin accretions from the surface of a substrate and texturing a resin without solvent swelling and permanganate etching and without using an electrolyte such as nitric acid capable of attacking specific metal. CONSTITUTION: The method comprises the steps of generating a free radical; and contacting the surface of a substrate having resin accretions with the free radical to desmear the surface of resin accretions and to texture a resin. Preferably the free radical comprises a hydroxyl radial, a halogen radical or their mixture, and is generated chemically, by thermal decomposition or by pyrolysis. Also the method comprises the steps of generating a free radical; and contacting the surface of a substrate having resin accretions with the free radical to remove some of the resin accretions; and contacting the surface of a substrate with a promoter to remove the additional resin accretions from the surface of a substrate and to texture a resin. Preferably the promoter comprises a permanganate etching solution.",

author = "{COBLEY ANDREW}, J and {GOOSEY MARTIN}, T and {POOLE MARK}, A",

year = "2004",

month = may,

day = "8",

language = "English",

type = "Patent",

note = "KR20040038728A; H05K 3/00,H05K 3/42,C08J 7/16",

}

TY - PAT

T1 - Method For Desmearing Resin Accretions And Texturing Resin Without Using Solvent

AU - COBLEY ANDREW, J

AU - GOOSEY MARTIN, T

AU - POOLE MARK, A

PY - 2004/5/8

Y1 - 2004/5/8

N2 - PURPOSE: Provided is a method for desmearing resin accretions from the surface of a substrate and texturing a resin without solvent swelling and permanganate etching and without using an electrolyte such as nitric acid capable of attacking specific metal. CONSTITUTION: The method comprises the steps of generating a free radical; and contacting the surface of a substrate having resin accretions with the free radical to desmear the surface of resin accretions and to texture a resin. Preferably the free radical comprises a hydroxyl radial, a halogen radical or their mixture, and is generated chemically, by thermal decomposition or by pyrolysis. Also the method comprises the steps of generating a free radical; and contacting the surface of a substrate having resin accretions with the free radical to remove some of the resin accretions; and contacting the surface of a substrate with a promoter to remove the additional resin accretions from the surface of a substrate and to texture a resin. Preferably the promoter comprises a permanganate etching solution.

AB - PURPOSE: Provided is a method for desmearing resin accretions from the surface of a substrate and texturing a resin without solvent swelling and permanganate etching and without using an electrolyte such as nitric acid capable of attacking specific metal. CONSTITUTION: The method comprises the steps of generating a free radical; and contacting the surface of a substrate having resin accretions with the free radical to desmear the surface of resin accretions and to texture a resin. Preferably the free radical comprises a hydroxyl radial, a halogen radical or their mixture, and is generated chemically, by thermal decomposition or by pyrolysis. Also the method comprises the steps of generating a free radical; and contacting the surface of a substrate having resin accretions with the free radical to remove some of the resin accretions; and contacting the surface of a substrate with a promoter to remove the additional resin accretions from the surface of a substrate and to texture a resin. Preferably the promoter comprises a permanganate etching solution.

M3 - Patent

M1 - KR20040038728A

Y2 - 2003/10/28

ER -

Method For Desmearing Resin Accretions And Texturing Resin Without Using Solvent

Abstract

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Research output

Desmear and texturing method

Cite this