Isovalent doping and the CiOi defect in germanium

Stavros Christopoulos, E.N. Sgourou, R.V. Vovk, Alexander Chroneos, C.A. Londos

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    Abstract

    Oxygen–carbon defects have been studied for decades in silicon but are less well established in germanium. In the present study we employ density functional theory calculations to study the structure of the CiOi defect in germanium. Additionally, we investigate the interaction the CiOi defect with isovalent dopants such as silicon and tin. It is calculated that the CiOi defects will preferentially form near isovalent dopants in germanium. Interestingly the structure of the dopant-CiOi defects is different with the Sn residing next to the Oi whereas the Si atom bonds with the Ci. The differences in the structure of CiOi defects in the vicinity of isovalent dopants are discussed.
    Original languageEnglish
    Pages (from-to)4261–4265
    Number of pages5
    JournalJournal of Materials Science: Materials in Electronics
    Volume29
    Issue number5
    Early online date6 Dec 2017
    DOIs
    Publication statusPublished - Mar 2018

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