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Influence of thermal oxidation on the interfacial properties of ultrathin strained silicon layers
- V. Ioannou-Sougleridis
- , N. Kelaidis
- , D. Skarlatos
- , C. Tsamis
- , S. N. Georga
- , C. A. Krontiras
- , Ph Komninou
- , Th Speliotis
- , P. Dimitrakis
- , B. Kellerman
- , M. Seacrist
Research output: Contribution to journal › Article › peer-review
1
Citation
(Scopus)