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Influence of thermal oxidation on the interfacial properties of ultrathin strained silicon layers
V. Ioannou-Sougleridis, N. Kelaidis, D. Skarlatos, C. Tsamis, S. N. Georga, C. A. Krontiras, Ph Komninou, Th Speliotis, P. Dimitrakis, B. Kellerman, M. Seacrist
Research output: Contribution to journal › Article › peer-review
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(Scopus)