Hierarchical process monitoring system identifies whether significant change of process conditions occurs as a result change in characteristics of certain self-inspecting sensor

Manus Patrick Henry; David James Sandoz; David William Clarke

Hierarchical process monitoring system identifies whether significant change of process conditions occurs as a result change in characteristics of certain self-inspecting sensor

Manus Patrick Henry (Inventor), David James Sandoz (Inventor), David William Clarke (Inventor)

Research output: Patent

Abstract

A process monitoring unit (14) and sensors (SEVA 1-36) having self-inspection capability, are provided in the higher and lower levels of the monitoring system. The monitoring unit monitors output signals of the sensors and identifies every significant change of the process conditions, and determines whether the change occurs as a result of the change in characteristics of a certain sensor or due to actual change in process conditions. An Independent claim is also included for process monitoring unit.

Original language	English
Patent number	DE10114206A1
IPC	G05B 23/02
Priority date	23/03/00
Filing date	23/03/01
Publication status	Published - 29 Nov 2001
Externally published	Yes

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Cite this

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title = "Hierarchical process monitoring system identifies whether significant change of process conditions occurs as a result change in characteristics of certain self-inspecting sensor",

abstract = "A process monitoring unit (14) and sensors (SEVA 1-36) having self-inspection capability, are provided in the higher and lower levels of the monitoring system. The monitoring unit monitors output signals of the sensors and identifies every significant change of the process conditions, and determines whether the change occurs as a result of the change in characteristics of a certain sensor or due to actual change in process conditions. An Independent claim is also included for process monitoring unit.",

author = "Henry, {Manus Patrick} and Sandoz, {David James} and Clarke, {David William}",

year = "2001",

month = nov,

day = "29",

language = "English",

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T1 - Hierarchical process monitoring system identifies whether significant change of process conditions occurs as a result change in characteristics of certain self-inspecting sensor

AU - Henry, Manus Patrick

AU - Sandoz, David James

AU - Clarke, David William

PY - 2001/11/29

Y1 - 2001/11/29

N2 - A process monitoring unit (14) and sensors (SEVA 1-36) having self-inspection capability, are provided in the higher and lower levels of the monitoring system. The monitoring unit monitors output signals of the sensors and identifies every significant change of the process conditions, and determines whether the change occurs as a result of the change in characteristics of a certain sensor or due to actual change in process conditions. An Independent claim is also included for process monitoring unit.

AB - A process monitoring unit (14) and sensors (SEVA 1-36) having self-inspection capability, are provided in the higher and lower levels of the monitoring system. The monitoring unit monitors output signals of the sensors and identifies every significant change of the process conditions, and determines whether the change occurs as a result of the change in characteristics of a certain sensor or due to actual change in process conditions. An Independent claim is also included for process monitoring unit.

M3 - Patent

M1 - DE10114206A1

Y2 - 2001/03/23

ER -

Hierarchical process monitoring system identifies whether significant change of process conditions occurs as a result change in characteristics of certain self-inspecting sensor

Abstract

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