Fabrication of multipassband moiré resonators in fibers by the dual-phase-mask exposure method

L. A. Everall, K. Sugden, J. A.R. Williams, I. Bennion, X. Liu, J. S. Aitchison, S. Thoms, R. M. De La Rue

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Abstract

We report on the fabrication of in-fiber moiré filters by dual exposure of a nondedicated chirped phase mask. This simple technique produces broadband filters whose structure depends only on an intermediate stretch between two identical UV exposures. We demonstrate moiré filters with as many as four narrow passbands within a 2-nm stopband.

Original languageEnglish
Pages (from-to)1473-1475
Number of pages3
JournalOptics Letters
Volume22
Issue number19
DOIs
Publication statusPublished - 1 Oct 1997
Externally publishedYes

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ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Everall, L. A., Sugden, K., Williams, J. A. R., Bennion, I., Liu, X., Aitchison, J. S., ... De La Rue, R. M. (1997). Fabrication of multipassband moiré resonators in fibers by the dual-phase-mask exposure method. Optics Letters, 22(19), 1473-1475. https://doi.org/10.1364/OL.22.001473