Abstract
PROBLEM TO BE SOLVED: To provide an electroless copper bath which is free of formaldehyde and is stable, provides acceptable copper deposits and is environmentally friendly.SOLUTION: Electroless copper plating baths are disclosed. The electroless copper baths are formaldehyde free and are environmentally friendly. The electroless copper baths are stable and deposit a bright copper deposit on substrates.
| Original language | English |
|---|---|
| Patent number | JP2013163867A |
| IPC | H05K 3/42,C23C 18/40,H05K3/18 |
| Priority date | 7/07/06 |
| Filing date | 16/05/13 |
| Publication status | Published - 22 Aug 2013 |
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Dive into the research topics of 'Electroless copper and redox couple'. Together they form a unique fingerprint.Research output
- 2 Patent
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Electroless copper and redox couples
POOLE, MARK, A. (Inventor), COBLEY, ANDREW, J. (Inventor), SINGH,, A. (Inventor) & HIRST, DEBORAH, V. (Inventor), 16 Mar 2008, IPC No. H05K 3/18 , C23C 18/38, C23C 18/40, Patent No. TW200813253A, 2 Jul 2007, Priority date 7 Jul 2006, Priority No. US20060819250PResearch output: Patent
Open Access -
Electroless Copper Plating Bath And Redox Couple
Poole, M. A. (Inventor), Cobley, A. (Inventor), Singh, A. (Inventor) & Hirst, D. V. (Inventor), 1 May 2008, IPC No. H05K 3/18, C23C 18/40, Patent No. JP2008101268A, 6 Jul 2007, Priority date 7 Jul 2006, Priority No. US20060819250PResearch output: Patent
Open Access
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