Effect of high-voltage pulse bias on the stress and morphology of CA-PVD TiN coatings

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Abstract

We investigated the role of high-voltage pulse bias (HVPB) on the structure, morphology and residual stress of TiN coatings produced with cathodic arc physical vapour deposition and compared them with the ones produced with DC bias. Annealing heat treatment was also performed for surveying stress-relieving behaviour within the coatings. The preferred orientation of the coatings changed from (111) to (220) by the application of HVPB. Coatings produced with DC bias exhibited Zone T structure, while the growth morphologies of the coatings produced with HVPB were very similar to the structures in the beginning of Zone II. The presence of Ar in the deposition environment increased the residual stress of all coatings. Intra-grain stresses of the coatings produced with DC bias were almost totally annihilated by annealing. However, for coatings produced with HVPB, stress relief magnitudes were very low, indicating that intra-grain defects could not be totally annihilated.

Original languageEnglish
Pages (from-to)13-21
Number of pages9
JournalSurface Engineering
Volume36
Issue number1
Early online date29 Aug 2018
DOIs
Publication statusPublished - 2 Jan 2020

Bibliographical note

This is an Accepted Manuscript of an article published by Taylor & Francis in Surface Engineering on 29/08/18 available online: http://www.tandfonline.com/10.1080/02670844.2018.1512731

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Keywords

  • High-voltage pulse bias
  • TiN coating
  • cathodic arc physical vapour deposition
  • morphology
  • residual stress

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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