Effect of high-voltage pulse bias on the stress and morphology of CA-PVD TiN coatings

Golnaz Taghavi Pourian Azar; Mustafa Urgen

doi:10.1080/02670844.2018.1512731

Effect of high-voltage pulse bias on the stress and morphology of CA-PVD TiN coatings

Golnaz Taghavi Pourian Azar, Mustafa Urgen

Istanbul Technical University

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

88 Downloads (Pure)

Abstract

We investigated the role of high-voltage pulse bias (HVPB) on the structure, morphology and residual stress of TiN coatings produced with cathodic arc physical vapour deposition and compared them with the ones produced with DC bias. Annealing heat treatment was also performed for surveying stress-relieving behaviour within the coatings. The preferred orientation of the coatings changed from (111) to (220) by the application of HVPB. Coatings produced with DC bias exhibited Zone T structure, while the growth morphologies of the coatings produced with HVPB were very similar to the structures in the beginning of Zone II. The presence of Ar in the deposition environment increased the residual stress of all coatings. Intra-grain stresses of the coatings produced with DC bias were almost totally annihilated by annealing. However, for coatings produced with HVPB, stress relief magnitudes were very low, indicating that intra-grain defects could not be totally annihilated.

Original language	English
Pages (from-to)	13-21
Number of pages	9
Journal	Surface Engineering
Volume	36
Issue number	1
Early online date	29 Aug 2018
DOIs	https://doi.org/10.1080/02670844.2018.1512731
Publication status	Published - 2 Jan 2020

Bibliographical note

This is an Accepted Manuscript of an article published by Taylor & Francis in Surface Engineering on 29/08/18 available online: http://www.tandfonline.com/10.1080/02670844.2018.1512731

Copyright © and Moral Rights are retained by the author(s) and/ or other copyright owners. A copy can be downloaded for personal non-commercial research or study, without prior permission or charge. This item cannot be reproduced or quoted extensively from without first obtaining permission in writing from the copyright holder(s). The content must not be changed in any way or sold commercially in any format or medium without the formal permission of the copyright holders.

Keywords

High-voltage pulse bias
TiN coating
cathodic arc physical vapour deposition
morphology
residual stress

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1080/02670844.2018.1512731

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Cite this

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title = "Effect of high-voltage pulse bias on the stress and morphology of CA-PVD TiN coatings",

abstract = "We investigated the role of high-voltage pulse bias (HVPB) on the structure, morphology and residual stress of TiN coatings produced with cathodic arc physical vapour deposition and compared them with the ones produced with DC bias. Annealing heat treatment was also performed for surveying stress-relieving behaviour within the coatings. The preferred orientation of the coatings changed from (111) to (220) by the application of HVPB. Coatings produced with DC bias exhibited Zone T structure, while the growth morphologies of the coatings produced with HVPB were very similar to the structures in the beginning of Zone II. The presence of Ar in the deposition environment increased the residual stress of all coatings. Intra-grain stresses of the coatings produced with DC bias were almost totally annihilated by annealing. However, for coatings produced with HVPB, stress relief magnitudes were very low, indicating that intra-grain defects could not be totally annihilated.",

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N1 - This is an Accepted Manuscript of an article published by Taylor & Francis in Surface Engineering on 29/08/18 available online: http://www.tandfonline.com/10.1080/02670844.2018.1512731 Copyright © and Moral Rights are retained by the author(s) and/ or other copyright owners. A copy can be downloaded for personal non-commercial research or study, without prior permission or charge. This item cannot be reproduced or quoted extensively from without first obtaining permission in writing from the copyright holder(s). The content must not be changed in any way or sold commercially in any format or medium without the formal permission of the copyright holders.

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N2 - We investigated the role of high-voltage pulse bias (HVPB) on the structure, morphology and residual stress of TiN coatings produced with cathodic arc physical vapour deposition and compared them with the ones produced with DC bias. Annealing heat treatment was also performed for surveying stress-relieving behaviour within the coatings. The preferred orientation of the coatings changed from (111) to (220) by the application of HVPB. Coatings produced with DC bias exhibited Zone T structure, while the growth morphologies of the coatings produced with HVPB were very similar to the structures in the beginning of Zone II. The presence of Ar in the deposition environment increased the residual stress of all coatings. Intra-grain stresses of the coatings produced with DC bias were almost totally annihilated by annealing. However, for coatings produced with HVPB, stress relief magnitudes were very low, indicating that intra-grain defects could not be totally annihilated.

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Effect of high-voltage pulse bias on the stress and morphology of CA-PVD TiN coatings

Abstract

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Golnaz Azar

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Effect of high-voltage pulse bias on the stress and morphology of CA-PVD TiN coatings

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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Golnaz Azar

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