@inproceedings{4168e44eaa3d43f28864e68bb16494de,
title = "Design and fabrication of specific filter responses in photosensitive fiber gratings produced by UV holographic exposure",
abstract = "Phase-mask designs were produced using a simple model for the process of fiber-core grating pattern generation considering both the distance from the mask to the fiber-core and the separation angles of the diffraction orders. A single resist was used later for both electron beam lithography (EBL) patterning and dry-etch process masking in producing the phase masks. Reflection spectra of fiber-gratings produced by period shifted phase masks with zero, quarter period, double quarter period, and half period shifts were described. Results were also presented on the realization of photosensitive filters and the relation of the spectra to the e-beam process and the weak, nonzero order diffraction components associated with the phase shift sections.",
author = "X. Liu and Aitchison, {J. S.} and {De La Rue}, {R. M.} and J.A.R. Williams and Everall, {L. A.} and I. Bennion",
year = "1997",
month = jan,
day = "1",
language = "English",
isbn = "1-55752-498-8",
volume = "11",
series = "Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS",
publisher = "Optical Society of America",
pages = "390--391",
booktitle = "OSA Technical Digest",
address = "United States",
note = "Conference on Lasers and Electro-Optics, CLEO ; Conference date: 18-05-1997 Through 23-05-1997",
}