It has been determined experimentally that doping silicon with large isovalent dopants such as tin can limit the concentration of vacancy-oxygen defects, this in turn, can be deleterious for the materials properties and its application. These results have been supported by recent calculations based on density functional theory employing hybrid functional. In the present study, we employ mass action analysis to calculate the impact of germanium, tin and lead doping on the relative concentrations of vacancy-oxygen defects and defect clusters in silicon under equilibrium conditions. In particular, we calculate how much isovalent doping is required to constrain vacancy-oxygen concentration in silicon and conclude that Sn and Pb doping are the most effective isovalent dopants. The results are discussed in view of recent experimental and computational results.
|Journal of Materials Science: Materials in Electronics
|Early online date
|29 Jan 2016
|Published - May 2016