Abstract
Suppression of the coffee ring effect is desirable in many industrial applications which utilize colloidal deposition from an evaporating liquid. Here we focus on the role of particle arrest at the liquid-air interface (surface capture) which occurs at high evaporation rates. It is known experimentally that this phenomenon inhibits particles from reaching the contact line, leading to a deposit which is closer to uniform. We are able to describe this effect using a simple 1D modeling framework and, utilizing asymptotic theory, parametrize our model by the ratio of the vertical advection and diffusion timescales. We show that our model is consistent with existing frameworks for small values of this parameter, but also predicts the surface layer formation seen experimentally at high evaporation rates. The formation of a surface layer leads to a deposit morphology which mimics the evaporative flux density and so is closest to uniform when evaporation has a constant strength across the liquid-air interface.
Original language | English |
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Article number | 064304 |
Number of pages | 29 |
Journal | Physical Review Fluids |
Volume | 9 |
Issue number | 6 |
DOIs | |
Publication status | Published - 11 Jun 2024 |
Bibliographical note
© 2024 authors. Published by the American Physical Society.This is an Open Access article distributed under the terms of the Creative
Commons Attribution License (http://creativecommons.org/licenses/by/4.0/),
which permits unrestricted use, distribution, and reproduction in any medium,
provided the original work is properly cited..
Funding
This work was supported by the EPSRC under Grants No. EP/W031426/1, No. EP/S029966/1, and No. EP/P031684/1.
Funders | Funder number |
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Engineering and Physical Sciences Research Council | EP/W031426/1, EP/S029966/1, EP/P031684/1 |