TY - JOUR
T1 - Analysis on Lapping and Polishing Pressure Distribution of Hard Magnetic Disk Substrate
AU - Cai, Guangqi
AU - Cai, Rui
AU - Lu, Yushan
AU - Min, Xinli
PY - 1998
Y1 - 1998
N2 - The contact model of lapping and polishing for magnetic disk substrate is presented. Based on elastic contact theory, pressure distribution for this model are analyzed. Further, the effects of various parameters, such as the material properties of the PVA(polyvinyl acetate), grinding stone, the polishing pad and the base plate, the thickness of the pad or the stone on the pressure distribution have been discussed.
AB - The contact model of lapping and polishing for magnetic disk substrate is presented. Based on elastic contact theory, pressure distribution for this model are analyzed. Further, the effects of various parameters, such as the material properties of the PVA(polyvinyl acetate), grinding stone, the polishing pad and the base plate, the thickness of the pad or the stone on the pressure distribution have been discussed.
M3 - Article
VL - 11
JO - Chinese Journal of Mechanical Engineering (English Edition)
JF - Chinese Journal of Mechanical Engineering (English Edition)
SN - 1000-9345
IS - 4
ER -