Abstract
The contact model of lapping and polishing for magnetic disk substrate is presented. Based on elastic contact theory, pressure distribution for this model are analyzed. Further, the effects of various parameters, such as the material properties of the PVA(polyvinyl acetate), grinding stone, the polishing pad and the base plate, the thickness of the pad or the stone on the pressure distribution have been discussed.
| Original language | English |
|---|---|
| Journal | Chinese Journal of Mechanical Engineering (English Edition) |
| Volume | 11 |
| Issue number | 4 |
| Publication status | Published - 1998 |
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Cite this
Cai, G., Cai, R., Lu, Y., & Min, X. (1998). Analysis on Lapping and Polishing Pressure Distribution of Hard Magnetic Disk Substrate. Chinese Journal of Mechanical Engineering (English Edition), 11(4).