Analysis on Lapping and Polishing Pressure Distribution of Hard Magnetic Disk Substrate

Guangqi Cai, Rui Cai, Yushan Lu, Xinli Min

Research output: Contribution to journal › Article

1 Citation (Scopus)

Abstract

The contact model of lapping and polishing for magnetic disk substrate is presented. Based on elastic contact theory, pressure distribution for this model are analyzed. Further, the effects of various parameters, such as the material properties of the PVA(polyvinyl acetate), grinding stone, the polishing pad and the base plate, the thickness of the pad or the stone on the pressure distribution have been discussed.
Original languageEnglish
JournalChinese Journal of Mechanical Engineering (English Edition)
Volume11
Issue number4
Publication statusPublished - 1998

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Lapping
Polishing
Pressure distribution
Polyvinyl acetates
Substrates
Materials properties

Cite this

Analysis on Lapping and Polishing Pressure Distribution of Hard Magnetic Disk Substrate. / Cai, Guangqi; Cai, Rui; Lu, Yushan; Min, Xinli.

In: Chinese Journal of Mechanical Engineering (English Edition), Vol. 11, No. 4, 1998.

Research output: Contribution to journal › Article

Cai, G, Cai, R, Lu, Y & Min, X 1998, 'Analysis on Lapping and Polishing Pressure Distribution of Hard Magnetic Disk Substrate' Chinese Journal of Mechanical Engineering (English Edition), vol. 11, no. 4.
Cai G, Cai R, Lu Y, Min X. Analysis on Lapping and Polishing Pressure Distribution of Hard Magnetic Disk Substrate. Chinese Journal of Mechanical Engineering (English Edition). 1998;11(4).
Cai, Guangqi ; Cai, Rui ; Lu, Yushan ; Min, Xinli. / Analysis on Lapping and Polishing Pressure Distribution of Hard Magnetic Disk Substrate. In: Chinese Journal of Mechanical Engineering (English Edition). 1998 ; Vol. 11, No. 4.
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JO - Chinese Journal of Mechanical Engineering (English Edition)

JF - Chinese Journal of Mechanical Engineering (English Edition)

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