Analysis on Lapping and Polishing Pressure Distribution of Hard Magnetic Disk Substrate

Guangqi Cai; Rui Cai; Yushan Lu; Xinli Min

Analysis on Lapping and Polishing Pressure Distribution of Hard Magnetic Disk Substrate

Guangqi Cai, Rui Cai, Yushan Lu, Xinli Min

Research output: Contribution to journal › Article › peer-review

Abstract

The contact model of lapping and polishing for magnetic disk substrate is presented. Based on elastic contact theory, pressure distribution for this model are analyzed. Further, the effects of various parameters, such as the material properties of the PVA(polyvinyl acetate), grinding stone, the polishing pad and the base plate, the thickness of the pad or the stone on the pressure distribution have been discussed.

Original language	English
Journal	Chinese Journal of Mechanical Engineering (English Edition)
Volume	11
Issue number	4
Publication status	Published - 1998

Cite this

@article{41957e7963784e4996acab4aa40c2e07,

title = "Analysis on Lapping and Polishing Pressure Distribution of Hard Magnetic Disk Substrate",

abstract = "The contact model of lapping and polishing for magnetic disk substrate is presented. Based on elastic contact theory, pressure distribution for this model are analyzed. Further, the effects of various parameters, such as the material properties of the PVA(polyvinyl acetate), grinding stone, the polishing pad and the base plate, the thickness of the pad or the stone on the pressure distribution have been discussed.",

author = "Guangqi Cai and Rui Cai and Yushan Lu and Xinli Min",

year = "1998",

language = "English",

volume = "11",

journal = "Chinese Journal of Engineering Design",

issn = "1000-9345",

publisher = "Springer Verlag",

number = "4",

}

TY - JOUR

T1 - Analysis on Lapping and Polishing Pressure Distribution of Hard Magnetic Disk Substrate

AU - Cai, Guangqi

AU - Cai, Rui

AU - Lu, Yushan

AU - Min, Xinli

PY - 1998

Y1 - 1998

N2 - The contact model of lapping and polishing for magnetic disk substrate is presented. Based on elastic contact theory, pressure distribution for this model are analyzed. Further, the effects of various parameters, such as the material properties of the PVA(polyvinyl acetate), grinding stone, the polishing pad and the base plate, the thickness of the pad or the stone on the pressure distribution have been discussed.

AB - The contact model of lapping and polishing for magnetic disk substrate is presented. Based on elastic contact theory, pressure distribution for this model are analyzed. Further, the effects of various parameters, such as the material properties of the PVA(polyvinyl acetate), grinding stone, the polishing pad and the base plate, the thickness of the pad or the stone on the pressure distribution have been discussed.

M3 - Article

VL - 11

JO - Chinese Journal of Engineering Design

JF - Chinese Journal of Engineering Design

SN - 1000-9345

IS - 4

ER -

Analysis on Lapping and Polishing Pressure Distribution of Hard Magnetic Disk Substrate

Abstract

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