Analysis on Lapping and Polishing Pressure Distribution of Hard Magnetic Disk Substrate

Guangqi Cai, Rui Cai, Yushan Lu, Xinli Min

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The contact model of lapping and polishing for magnetic disk substrate is presented. Based on elastic contact theory, pressure distribution for this model are analyzed. Further, the effects of various parameters, such as the material properties of the PVA(polyvinyl acetate), grinding stone, the polishing pad and the base plate, the thickness of the pad or the stone on the pressure distribution have been discussed.
Original languageEnglish
JournalChinese Journal of Mechanical Engineering (English Edition)
Volume11
Issue number4
Publication statusPublished - 1998

Fingerprint

Lapping
Polishing
Pressure distribution
Polyvinyl acetates
Substrates
Materials properties

Cite this

Analysis on Lapping and Polishing Pressure Distribution of Hard Magnetic Disk Substrate. / Cai, Guangqi; Cai, Rui; Lu, Yushan; Min, Xinli.

In: Chinese Journal of Mechanical Engineering (English Edition), Vol. 11, No. 4, 1998.

Research output: Contribution to journalArticle

@article{41957e7963784e4996acab4aa40c2e07,
title = "Analysis on Lapping and Polishing Pressure Distribution of Hard Magnetic Disk Substrate",
abstract = "The contact model of lapping and polishing for magnetic disk substrate is presented. Based on elastic contact theory, pressure distribution for this model are analyzed. Further, the effects of various parameters, such as the material properties of the PVA(polyvinyl acetate), grinding stone, the polishing pad and the base plate, the thickness of the pad or the stone on the pressure distribution have been discussed.",
author = "Guangqi Cai and Rui Cai and Yushan Lu and Xinli Min",
year = "1998",
language = "English",
volume = "11",
journal = "Chinese Journal of Mechanical Engineering (English Edition)",
issn = "1000-9345",
publisher = "Springer Verlag",
number = "4",

}

TY - JOUR

T1 - Analysis on Lapping and Polishing Pressure Distribution of Hard Magnetic Disk Substrate

AU - Cai, Guangqi

AU - Cai, Rui

AU - Lu, Yushan

AU - Min, Xinli

PY - 1998

Y1 - 1998

N2 - The contact model of lapping and polishing for magnetic disk substrate is presented. Based on elastic contact theory, pressure distribution for this model are analyzed. Further, the effects of various parameters, such as the material properties of the PVA(polyvinyl acetate), grinding stone, the polishing pad and the base plate, the thickness of the pad or the stone on the pressure distribution have been discussed.

AB - The contact model of lapping and polishing for magnetic disk substrate is presented. Based on elastic contact theory, pressure distribution for this model are analyzed. Further, the effects of various parameters, such as the material properties of the PVA(polyvinyl acetate), grinding stone, the polishing pad and the base plate, the thickness of the pad or the stone on the pressure distribution have been discussed.

M3 - Article

VL - 11

JO - Chinese Journal of Mechanical Engineering (English Edition)

JF - Chinese Journal of Mechanical Engineering (English Edition)

SN - 1000-9345

IS - 4

ER -